Deposition and Properties of Titanium Nitride Films Produced by Dc Reactive Magnetron Sputtering

AuthID
 P-00H-65W
3
Author(s)
Azevedo, A
·
dos Santos, M
Tipo de Documento
Article
Year published
1995
Publicado
in Vacuum, ISSN: 0042-207X
Volume: 46, Número: 3, Páginas: 233-239
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ISSN: 0042-207X
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