Influence of O2 Partial Pressure on the Growth of Nanostructured Anatase Phase Tio2 Thin Films Prepared by Dc Reactive Magnetron Sputtering

AuthID
 P-00H-C1C
4
Author(s)
Sério, S
·
Melo Jorge, M
·
Maneira, M
·
Tipo de Documento
Article
Year published
2011
Publicado
in Materials Chemistry and Physics, ISSN: 0254-0584
Volume: 126, Número: 1-2, Páginas: 73-81
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ISSN: 0254-0584
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