Engineering of Plasma Deposition Systems Used for Producing Large Area A-Si:h Devices

AuthID
P-00H-F3W
4
Author(s)
Carvalho, N
·
Guimarães, L
Tipo de Documento
Article
Year published
1991
Publicado
in Journal of Non-Crystalline Solids, ISSN: 0022-3093
Volume: 137-138, Páginas: 757-760
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ISSN: 0022-3093
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