Study of the Effect of Different Plasma-Enhanced Chemical Vapour Deposition Reactor Configurations on the Properties of Hydrogenated Amorphous Silicon Thin Films

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 P-00H-MZT
1
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Article
Year published
2000
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in Philosophical Magazine B, ISSN: 1364-2812
Volume: 80, Número: 4, Páginas: 475-486
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ISSN: 1364-2812
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