Study of the Effect of Different Plasma-Enhanced Chemical Vapour Deposition Reactor Configurations on the Properties of Hydrogenated Amorphous Silicon Thin Films

AuthID
 P-00H-NNM
5
Author(s)
Silva V.
·
Ferreira I.
·
Tipo de Documento
Article
Year published
2000
Publicado
in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, ISSN: 13642812
Volume: 80, Número: 4, Páginas: 475-486 (11)
Indexing
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85023702136
Source Identifiers
ISSN: 13642812
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service