Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 Mhz and 13.56 Mhz

AuthID
 P-00H-YR8
8
Author(s)
Silva, V
·
Lebib, S
·
Roca i Cabarrocas, P
·
Guimarães, L
·
Tipo de Documento
Article
Year published
2003
Publicado
in Jpn. J. Appl. Phys. - Japanese Journal of Applied Physics, ISSN: 0021-4922
Volume: 42, Número: Part 1, No. 8, Páginas: 4935-4942
Indexing
Crossref®
Google Scholar®
Publication Identifiers
Source Identifiers
ISSN: 0021-4922
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service