Role of Trimethylboron to Silane Ratio on the Properties of P-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition

AuthID
 P-00J-00A
5
Author(s)
Bernacka-Wojcik, I
·
Tipo de Documento
Article
Year published
2010
Publicado
in Journal of Nanoscience and Nanotechnology - J. Nanosci. Nanotech., ISSN: 1533-4880
Volume: 10, Número: 4, Páginas: 2547-2551
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ISSN: 1533-4880
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