Low Filament Temperature Deposition of A-Si:h by Catalytic Chemical Vapor Deposition

AuthID
 P-00J-2AC
6
Author(s)
Grebner, S
·
Wang, F
·
schwarz, R
·
Chu, V
·
Conde, J
Tipo de Documento
Article
Year published
1993
Publicado
in MRS Proc. - MRS Proceedings, ISSN: 1946-4274
Volume: 297
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Source Identifiers
ISSN: 1946-4274
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