Hydrogen Incorporation in Silicon Oxide Films Deposited by Arf Laser-Induced Chemical Vapor Deposition

AuthID
P-00J-C3N
8
Author(s)
Parada E.G.
·
González P.
·
Serra J.
·
León B.
·
Pérez-Amor M.
·
da Silva M.F.
·
Soares J.C.
Tipo de Documento
Article
Year published
1995
Publicado
in Journal of Non-Crystalline Solids, ISSN: 00223093
Volume: 187, Páginas: 75-80 (5)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84964768377
Source Identifiers
ISSN: 00223093
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