Origin of Gas Impurities in Sputtering Plasmas During Thin Film Deposition

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P-00J-CH7
1
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Tipo de Documento
Article
Year published
1991
Publicado
in Vacuum, ISSN: 0042-207X
Volume: 42, Número: 12, Páginas: 753-756
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ISSN: 0042-207X
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