The Effect of the Flow of Silane on the Properties of A-Si:h Deposited by Concentric-Electrode Radio Frequency Glow-Discharge

AuthID
 P-00J-M4P
4
Author(s)
Chan, KK
·
Blum, JM
·
Arienzo, M
Tipo de Documento
Article
Year published
1992
Publicado
in J. Appl. Phys. - Journal of Applied Physics, ISSN: 0021-8979
Volume: 71, Número: 8, Páginas: 3990
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ISSN: 0021-8979
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