Argon Assisted Chemical Vapor Deposition of Cro2: An Efficient Process Leading to High Quality Epitaxial Films

AuthID
P-00K-GFR
Tipo de Documento
Article
Year published
2016
Publicado
in JOURNAL OF ALLOYS AND COMPOUNDS, ISSN: 0925-8388
Volume: 684, Páginas: 98-104 (7)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84969916897
Wos: WOS:000379792800015
Source Identifiers
ISSN: 0925-8388
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