Atomic Layer Deposition of Al2O3 onto Sn-Doped In2O3: Absence of Self-Limited Adsorption During Initial Growth by Oxygen Diffusion from the Substrate and Band Offset Modification by Fermi Level Pinning in Al2O3

AuthID
P-002-2CZ
5
Author(s)
Bayer, TJM
·
Wachau, A
·
Fuchs, A
·
Klein, A
Tipo de Documento
Article
Year published
2012
Publicado
in CHEMISTRY OF MATERIALS, ISSN: 0897-4756
Volume: 24, Número: 23, Páginas: 4503-4510 (8)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84870908726
Wos: WOS:000312122400003
Source Identifiers
ISSN: 0897-4756
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