Effect on the Electrical and Morphological Properties of Bi Incorporation into Zno:ga and Zno:al Thin Films Deposited by Confocal Magnetron Sputtering (Vol152, Pg 252, 2018)

AuthID
P-00P-059
5
Author(s)
Tipo de Documento
Correction
Year published
2018
Publicado
in VACUUM, ISSN: 0042-207X
Volume: 154, Páginas: 340-340 (1)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-85047650785
Wos: WOS:000438000300049
Source Identifiers
ISSN: 0042-207X
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