Hydrogen Plasma Treatment of Very Thin P-Type Nanocrystalline Si Films Grown by Rf-Pecvd in the Presence of B(Ch3)(3)

AuthID
 P-002-723
10
Author(s)
Gaspar, D
·
Tipo de Documento
Article
Year published
2012
Publicado
in SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS, ISSN: 1468-6996
Volume: 13, Número: 4, Páginas: 045004 (8)
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Publication Identifiers
SCOPUS: 2-s2.0-84866330763
Wos: WOS:000310526100006
Source Identifiers
ISSN: 1468-6996
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