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Raman Analysis of Si-C-N Films Grown by Reactive Magnetron Sputtering

AuthID
P-000-79P

Author(s)

Liang, EJ

Zhang, JW

Leme, J

Moura, C

Cunha, L

Tipo de Documento

Article

Year published

2004

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 469, Número: SPEC. ISS., Páginas: 410-415 (6)

Conference

31St International Conference on Metallurgical Coatings and Thin Films, Date: APR 19-23, 2004, Location: San Diego, CA, Patrocinadores: AVS Sci & Technol Soc, Adv Surface Engn Div

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Publication Identifiers

DOI: 10.1016/j.tsf.2004.09.002

SCOPUS: 2-s2.0-10044272974

Wos: WOS:000225724300070

Source Identifiers

ISSN: 0040-6090

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Raman Analysis of Si-C-N Films Grown by Reactive Magnetron Sputtering

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Raman Analysis of Si-C-N Films Grown by Reactive Magnetron Sputtering

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