Effect of Hot-Filament Annealing in a Hydrogen Atmosphere on the Electrical and Structural Properties of Nb-Doped Tio2 Sputtered Thin Films

AuthID
P-002-DSQ
14
Author(s)
Tipo de Documento
Article
Year published
2012
Publicado
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 520, Número: 7, Páginas: 2514-2519 (6)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84856390740
Wos: WOS:000301085100022
Source Identifiers
ISSN: 0040-6090
Export Publication Metadata
Info
At this moment we don't have any links to full text documens.