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Optimization of Exposure Parameters for Lift-Off Process of Sub-100 Features Using a Negative Tone Electron Beam Resist

AuthID
P-002-F1H

Author(s)

Leitao, DC

Hoang, DQ

Tipo de Documento

Proceedings Paper

Year published

2012

Publicado

in 2012 12TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO), ISSN: 1944-9399

Conference

12Th Ieee International Conference on Nanotechnology (Ieee-Nano), Date: AUG 20-23, 2012, Location: Birmingham, ENGLAND, Patrocinadores: IEEE, IEEE Nanotechnol Council, Univ Birmingham, Inst Phys (IOP)

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Publication Identifiers

DOI: 10.1109/nano.2012.6321945

SCOPUS: 2-s2.0-84869200573

Wos: WOS:000309933900060

Source Identifiers

ISSN: 1944-9399

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Optimization of Exposure Parameters for Lift-Off Process of Sub-100 Features Using a Negative Tone Electron Beam Resist

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Optimization of Exposure Parameters for Lift-Off Process of Sub-100 Features Using a Negative Tone Electron Beam Resist

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