Mos Capacitance Measurements for Peald Tio2 Dielectric Films Grown Under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion

AuthID
 P-00R-RPS
9
Author(s)
Chiappim, W
·
Watanabe, M
·
Dias, V
·
Testoni, G
·
Rangel, R
·
Fraga, M
·
Maciel, H
·
Tipo de Documento
Article
Year published
2020
Publicado
in NANOMATERIALS, ISSN: 2079-4991
Volume: 10, Número: 2
Indexing
Wos®
Scopus®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85079596101
Wos: WOS:000522456300157
Source Identifiers
ISSN: 2079-4991
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