Properties of Sputtered Basi2 Thin Films Annealed in Vacuum Condition

AuthID
P-00R-XA2
5
Author(s)
Tian, YL
·
Montes, AR
·
Zeman, M
Tipo de Documento
Article
Year published
2020
Publicado
in JAPANESE JOURNAL OF APPLIED PHYSICS, ISSN: 0021-4922
Volume: 59, Número: SF
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-85083332493
Wos: WOS:000520008100009
Source Identifiers
ISSN: 0021-4922
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