Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-Frequency Plasma Jets

AuthID
 P-00R-ZDD
12
Author(s)
Kuchakova, I
·
Ionita, MD
·
Ionita, ER
·
Lazea Stoyanova, A
·
Brajnicov, S
·
Mitu, B
·
Dinescu, G
·
De Vrieze, M
·
Cvelbar, U
·
Leys, C
·
Yu Nikiforov, A
Tipo de Documento
Article
Year published
2020
Publicado
in MATERIALS, ISSN: 1996-1944
Volume: 13, Número: 6, Páginas: 1296 (16)
Indexing
Wos®
Scopus®
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Publication Identifiers
SCOPUS: 2-s2.0-85082714450
Wos: WOS:000529208000035
Source Identifiers
ISSN: 1996-1944
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