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Competitive and Cost Effective Copper/Low-K Interconnect (Beol) for 28Nm Cmos Technologies
AuthID
P-00S-32B
P-00S-32B
55
Author(s)
Augur, R
·Child, C
·Ahn, JH
·Tang, TJ
·Clevenger, L
·Kioussis, D
·Masuda, H
·Srivastava, R
·Oda, Y
·Oguma, H
·[+35]·
Shaw, T
·Osborne, G
·Grill, A
·Edelstein, D
·Restaino, D
·Molis, S
·Spooner, T
·Biery, G
·Sampson, R
Tipo de Documento
Proceedings Paper
Year published
2010
Publicado
in Advanced Metallization Conference (AMC), ISSN: 1540-1766
Páginas: 41-42
Conference
Advanced Metallization Conference 2010, Date: 5 October 2010 through 7 October 2010, Location: Albany, NY
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-79957664080
Source Identifiers
ISSN: 1540-1766
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| Name Order | Nome | Name Order | Nome | Name Order | Nome | ||
|---|---|---|---|---|---|---|---|
| 1 | Augur, R; | 2 | Child, C; | 3 | Ahn, JH; | ||
| 4 | Tang, TJ; | 5 | Clevenger, L; | 6 | Kioussis, D; | ||
| 7 | Masuda, H; | 8 | Srivastava, R; | 9 | Oda, Y; | ||
| 10 | Oguma, H; | 11 | Quon, R; | 12 | Kim, B; | ||
| 13 | Sheng, H; | 14 | Hirooka, S; | 15 | Gupta, R; | ||
| 16 | Thomas, A; | 17 | Singh, SM; | 18 | Fang, Q; | ||
| 19 | Schiwon, R; | 20 | Hamieh, B; | 21 | Wornyo, E; | ||
| 22 | Allen, S; | 23 | Kaltalioglu, E; | 24 | Fryxell, T; | ||
| 25 | Ogino, A; | 26 | Shimada, E; | 27 | Aizawa, H; | ||
| 28 | Minda, H; | 29 | Kim, SO; | 30 | Oki, T; | ||
| 31 | Fujii, K; | 32 | Pallachalil, M; | 33 | Takewaki, T; | ||
| 34 | Hu, CK; | 35 | Sundloff, B; | 36 | Permana, D; | ||
| 37 | Bolom, T; | 38 | Engel, B; | 39 | Labelle, C; | ||
| 40 | Sapp, B; | 41 | Shobha, H; | 42 | Gates, S; | ||
| 43 | Ryan, ET; | 44 | Bonilla, G; | 45 | Daubenspeck, T; | ||
| 46 | Shaw, T; | 47 | Osborne, G; | 48 | Grill, A; | ||
| 49 | Edelstein, D; | 50 | Restaino, D; | 51 | Molis, S; | ||
| 52 | Spooner, T; | 53 | Ferreira, P ; | 54 | Biery, G; | ||
| 55 | Sampson, R; |
