Atomic Layer Deposition of High-Kappa Layers on Polycrystalline Diamond for Mos Devices: a Review

AuthID
 P-00S-WCQ
3
Author(s)
Jaggernauth, A
·
Tipo de Documento
Review
Year published
2020
Publicado
in JOURNAL OF MATERIALS CHEMISTRY C, ISSN: 2050-7526
Volume: 8, Número: 38, Páginas: 13127-13153 (27)
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Publication Identifiers
SCOPUS: 2-s2.0-85094817885
Wos: WOS:000578027500001
Source Identifiers
ISSN: 2050-7526
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