Development of Electron Beam Resists Based on Amorphous Polyphenols with Low Molecular Weight and Narrow Dispersion

AuthID
 P-00T-9XF
12
Author(s)
Hirayama, T
·
Matsumaru, S
·
Ogata, T
·
Hada, H
·
Onodera, J
·
Arai, T
·
Yamaguchi, A
·
Shiraishi, H
·
Fukuda, H
·
Ueda, M
1
Editor(es)
John L.Sturtevant
Tipo de Documento
Proceedings Paper
Year published
2005
Publicado
in Advances in Resist Technology and Processing XXII
Indexing
Crossref®7
Google Scholar®
Publication Identifiers
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2025 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service