High-Performance and Industrially Viable Nanostructured Siox Layers for Interface Passivation in Thin Film Solar Cells

AuthID
 P-00T-CNV
17
Author(s)
Cunha, JMV
·
Oliveira, K
·
Lontchi, J
·
Lopes, TS
·
Curado, MA
·
Barbosa, JRS
·
Vinhais, C
·
Chen, WC
·
Borme, J
·
Fonseca, H
·
Gaspar, J
·
Flandre, D
·
Edoff, M
·
Teixeira, JP
·
Fernandes, PA
·
Salome, PMP
Tipo de Documento
Article in Press
Year published
2021
Publicado
in SOLAR RRL, ISSN: 2367-198X
Volume: 5, Número: 3
Indexing
Wos®
Scopus®
Crossref®15
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85099750008
Wos: WOS:000612038400001
Source Identifiers
ISSN: 2367-198X
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