Characteristics of Silicon Doped Chromium Nitride Coatings Produced by Magnetron Sputtering: the Influence of Processing Parameters

AuthID
 P-002-PVK
2
Author(s)
Tipo de Documento
Article
Year published
2011
Publicado
in JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, ISSN: 1454-4164
Volume: 13, Número: 7-8, Páginas: 887-891 (5)
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Wos®
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-80052988546
Wos: WOS:000294887100029
Source Identifiers
ISSN: 1454-4164
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