Influence of the Deposition Parameters on the Growth of Sige Nanocrystals Embedded in Al2O3 Matrix

AuthID
 P-002-SYE
11
Author(s)
Vieira, EMF
·
Pinto, SRC
·
Buljan, M
·
Bernstorff, S
·
Tipo de Documento
Article
Year published
2011
Publicado
in MICROELECTRONIC ENGINEERING, ISSN: 0167-9317
Volume: 88, Número: 4, Páginas: 509-513 (5)
Conference
Emrs 2010 Spring Meeting on Post-Si-Cmos Electronic Devices - The Role of Ge and Iii-V Materials, Date: JUN 07-11, 2010, Location: Strasbourg, FRANCE, Patrocinadores: SAFC, Aixtron, IBM
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Publication Identifiers
SCOPUS: 2-s2.0-79751525029
Wos: WOS:000288524100047
Source Identifiers
ISSN: 0167-9317
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