Latest Advance on Seamless Metal-Semiconductor Contact with Ultralow Barrier in 2D-Material-Based Devices

AuthID
 P-00W-DRM
5
Author(s)
Chen, SY
·
Wang, S
·
Wang, C
·
Liu, Q
Tipo de Documento
Review
Year published
2022
Publicado
in NANO TODAY, ISSN: 1748-0132
Volume: 42
Indexing
Wos®
Google Scholar®
Publication Identifiers
Wos: WOS:000772808700001
Source Identifiers
ISSN: 1748-0132
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