Effect of Substrate Bias Voltage on the Physical Properties of Dc Reactive Magnetron Sputtered Nio Thin Films

AuthID
 P-002-V4D
3
Author(s)
Tipo de Documento
Article
Year published
2011
Publicado
in MATERIALS CHEMISTRY AND PHYSICS, ISSN: 0254-0584
Volume: 125, Número: 3, Páginas: 434-439 (6)
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Publication Identifiers
SCOPUS: 2-s2.0-78650029368
Wos: WOS:000286904800021
Source Identifiers
ISSN: 0254-0584
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