Optimizing Pmma Solutions to Suppress Contamination in the Transfer of Cvd Graphene for Batch Production

AuthID
 P-00X-63D
9
Author(s)
Liao, CD
·
Capasso, A
·
Queiros, T
·
Domingues, T
·
Cerqueira, F
·
Nicoara, N
·
Borme, J
·
Tipo de Documento
Article
Year published
2022
Publicado
in BEILSTEIN JOURNAL OF NANOTECHNOLOGY, ISSN: 2190-4286
Volume: 13, Páginas: 796-806 (11)
Indexing
Wos®
Scopus®
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Pubmed®
Google Scholar®
Publication Identifiers
Pubmed: 36105686
SCOPUS: 2-s2.0-85138029653
Wos: WOS:000847991800001
Source Identifiers
ISSN: 2190-4286
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