In Situ Annealing Behavior of Cu Thin Films Deposited over Co-W Diffusion Barrier Layers

AuthID
P-00X-78F
3
Author(s)
Oliveira, BMC
·
Tipo de Documento
Article
Year published
2022
Publicado
in APPLIED SCIENCES-BASEL, ISSN: 2076-3417
Volume: 12, Número: 19, Páginas: 9778 (10)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-85139903464
Unpaywall: 10.3390/app12199778
Wos: WOS:000866613900001
Source Identifiers
ISSN: 2076-3417
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