Semiconductors Application Forms and Doping Benefits to Wastewater Treatment: A Comparison of Tio2, Wo3, and G-C3N4

AuthID
 P-00X-D91
3
Author(s)
Fernandes, E
·
Gomes, J
·
Tipo de Documento
Review
Year published
2022
Publicado
in CATALYSTS
Volume: 12, Número: 10, Páginas: 1218 (42)
Indexing
Wos®
Scopus®
Crossref®17
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85140905391
Wos: WOS:000872526300001
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