Influence of Substrate Biasing on (Al, Ti)N Thin Films Deposited by a Hybrid Hipims/Dc Sputtering Process

AuthID
 P-003-1DJ
7
Author(s)
Guillaumot, A
·
Lapostolle, F
·
Langlade, C
·
Billard, A
·
Dublanche Tixier, C
Tipo de Documento
Article
Year published
2010
Publicado
in IEEE TRANSACTIONS ON PLASMA SCIENCE, ISSN: 0093-3813
Volume: 38, Número: 11, Páginas: 3040-3045 (6)
Indexing
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Scopus®
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Publication Identifiers
SCOPUS: 2-s2.0-78349305502
Wos: WOS:000284089300006
Source Identifiers
ISSN: 0093-3813
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