Can We Rationally Design and Operate Spatial Atomic Layer Deposition Systems for Steering the Growth Regime of Thin Films?

AuthID
 P-00Y-EHF
10
Author(s)
Vale, JP
·
Sekkat, A
·
Gheorghin, T
·
Sevim, S
·
Mavromanolaki, E
·
Flouris, AD
·
Pane, S
·
Munoz-Rojas, D
·
Puigmarti-Luis, J
·
Tipo de Documento
Article in Press
Year published
2023
Publicado
in JOURNAL OF PHYSICAL CHEMISTRY C, ISSN: 1932-7447
Volume: 127, Número: 19, Páginas: 9425-9436 (12)
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Publication Identifiers
Pubmed: 37223651
SCOPUS: 2-s2.0-85159596138
Wos: WOS:000984392700001
Source Identifiers
ISSN: 1932-7447
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