Vitor Manuel Guerra Vaz da Silva
AuthID: R-000-HMR
41
TITLE: Silicon nanostructure thin film materials Full Text
AUTHORS: Martins, R ; Aguas, H ; Silva, V; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLISHED: 2002, SOURCE: 4th Iberian Vacuum Meeting (IVM-4) in VACUUM, VOLUME: 64, ISSUE: 3-4
AUTHORS: Martins, R ; Aguas, H ; Silva, V; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLISHED: 2002, SOURCE: 4th Iberian Vacuum Meeting (IVM-4) in VACUUM, VOLUME: 64, ISSUE: 3-4
42
TITLE: Silicon carbide alloys produced by hot wire, hot wire plasma-assisted and plasma-enhanced CVD techniques Full Text
AUTHORS: Ferreira, I ; Costa, MEV ; Pereira, L ; Fortunato, E ; Martins, R ; Ramos, AR ; Silva, MF;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
AUTHORS: Ferreira, I ; Costa, MEV ; Pereira, L ; Fortunato, E ; Martins, R ; Ramos, AR ; Silva, MF;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
43
TITLE: Mass spectroscopy analysis during the deposition of a-SiC : H and a-C : H films produced by hot wire and hot wire plasma-assisted techniques Full Text
AUTHORS: Ferreira, I ; Silva, V; Aguas, H ; Fortunato, E ; Martins, R ;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
AUTHORS: Ferreira, I ; Silva, V; Aguas, H ; Fortunato, E ; Martins, R ;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
44
TITLE: Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique Full Text
AUTHORS: Martins, R ; Silva, V; Aguas, H ; Cabrita, A; Ferreira, I ; Fortunato, E ;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
AUTHORS: Martins, R ; Silva, V; Aguas, H ; Cabrita, A; Ferreira, I ; Fortunato, E ;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
45
TITLE: Thin film position sensitive detectors based on pin amorphous silicon carbide structures Full Text
AUTHORS: Cabrita, A; Figueiredo, J; Pereira, L ; Aguas, H ; Silva, V; Brida, D; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
AUTHORS: Cabrita, A; Figueiredo, J; Pereira, L ; Aguas, H ; Silva, V; Brida, D; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLISHED: 2001, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 184, ISSUE: 1-4
46
TITLE: Role of ion bombardment and plasma impedance on the performances presented by undoped a-Si : H films Full Text
AUTHORS: Martins, R ; Aguas, H ; Ferreira, I ; Silva, V; Cabrita, A; Fortunato, E ;
PUBLISHED: 2001, SOURCE: 3rd Symposium O on Thin Film Materials for Large Area Electronics of the E-MRS 2000 Spring Meeting in THIN SOLID FILMS, VOLUME: 383, ISSUE: 1-2
AUTHORS: Martins, R ; Aguas, H ; Ferreira, I ; Silva, V; Cabrita, A; Fortunato, E ;
PUBLISHED: 2001, SOURCE: 3rd Symposium O on Thin Film Materials for Large Area Electronics of the E-MRS 2000 Spring Meeting in THIN SOLID FILMS, VOLUME: 383, ISSUE: 1-2
47
TITLE: Nanostructured silicon films produced by PECVD
AUTHORS: Martins, R ; Aguas, H ; Silva, V; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLISHED: 2001, SOURCE: Amorphous and Heterogeneous Silicon Based Films 2001 in Materials Research Society Symposium - Proceedings, VOLUME: 664
AUTHORS: Martins, R ; Aguas, H ; Silva, V; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLISHED: 2001, SOURCE: Amorphous and Heterogeneous Silicon Based Films 2001 in Materials Research Society Symposium - Proceedings, VOLUME: 664
INDEXED IN: 
Scopus
Scopus48
TITLE: Silicon films produced by PECVD under powder formation conditions
AUTHORS: Martins, R ; Aguas, H ; Silva, V; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLISHED: 2001, SOURCE: 4th European Workshop on Dusty and Colloidal Plasmas in Materials Science Forum, VOLUME: 382
AUTHORS: Martins, R ; Aguas, H ; Silva, V; Ferreira, I ; Cabrita, A; Fortunato, E ;
PUBLISHED: 2001, SOURCE: 4th European Workshop on Dusty and Colloidal Plasmas in Materials Science Forum, VOLUME: 382
INDEXED IN: Scopus
Scopus49
TITLE: Role of the gas temperature and power to gas flow ratio on powder formation and properties of films grown by the PECVD technique Full Text
AUTHORS: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Spring Meeting of the European-Materials-Research-Society in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, VOLUME: 69
AUTHORS: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Spring Meeting of the European-Materials-Research-Society in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, VOLUME: 69
50
TITLE: Silicon films produced by PECVD under powder formation conditions
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
INDEXED IN: 
WOS
WOS