S. Arekat
AuthID: R-006-QS0
1
TITLE: Optoelectronic and structural properties of amorphous silicon-carbon alloys deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition Full Text
AUTHORS: Conde, JP ; Chu, V ; da Silva, MF; Kling, A ; Dai, Z; Soares, JC ; Arekat, S; Fedorov, A ; Berberan Santos, MN ; Giorgis, F; Pirri, CF;
PUBLISHED: 1999, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 85, ISSUE: 6
AUTHORS: Conde, JP ; Chu, V ; da Silva, MF; Kling, A ; Dai, Z; Soares, JC ; Arekat, S; Fedorov, A ; Berberan Santos, MN ; Giorgis, F; Pirri, CF;
PUBLISHED: 1999, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 85, ISSUE: 6
2
TITLE: Amorphous and microcrystalline silicon deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition
AUTHORS: Conde, JP ; Schotten, V; Arekat, S; Brogueira, P ; Sousa, R; Chu, V ;
PUBLISHED: 1997, SOURCE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 36, ISSUE: 1A
AUTHORS: Conde, JP ; Schotten, V; Arekat, S; Brogueira, P ; Sousa, R; Chu, V ;
PUBLISHED: 1997, SOURCE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 36, ISSUE: 1A
3
TITLE: Amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition at filament temperatures between 1500 and 1900 degrees C Full Text
AUTHORS: Brogueira, P ; Conde, JP ; Arekat, S; Chu, V ;
PUBLISHED: 1996, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 79, ISSUE: 11
AUTHORS: Brogueira, P ; Conde, JP ; Arekat, S; Chu, V ;
PUBLISHED: 1996, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 79, ISSUE: 11
4
TITLE: LOW FILAMENT TEMPERATURE DEPOSITION OF A-SI-H BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION Full Text
AUTHORS: BROGUEIRA, P ; CONDE, JP ; AREKAT, S; CHU, V ;
PUBLISHED: 1995, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 78, ISSUE: 6
AUTHORS: BROGUEIRA, P ; CONDE, JP ; AREKAT, S; CHU, V ;
PUBLISHED: 1995, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 78, ISSUE: 6
INDEXED IN: 
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WOS
Scopus WOS5
TITLE: Low filament temperature deposition of a-Si:H by hot-wire chemical vapor deposition Full Text
AUTHORS: Brogueira, P; Conde, JP; Arekat, S; Chu, V;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 6
AUTHORS: Brogueira, P; Conde, JP; Arekat, S; Chu, V;
PUBLISHED: 1995, SOURCE: J. Appl. Phys. - Journal of Applied Physics, VOLUME: 78, ISSUE: 6
INDEXED IN: 
CrossRef
CrossRef