Norbert Schell
AuthID: R-00F-A53
31
TITLE: Characterization of Sputtered Shape Memory Alloy Ni-Ti Films by Cross-sectional TEM and SEM
AUTHORS: Martins, RMS ; Muecklich, A; Schell, N; Silva, RJC ; Mahesh, KK; Braz Fernandes, FMB ;
PUBLISHED: 2008, SOURCE: MICROSCOPY AND MICROANALYSIS, VOLUME: 14, ISSUE: SUPPL. 3
AUTHORS: Martins, RMS ; Muecklich, A; Schell, N; Silva, RJC ; Mahesh, KK; Braz Fernandes, FMB ;
PUBLISHED: 2008, SOURCE: MICROSCOPY AND MICROANALYSIS, VOLUME: 14, ISSUE: SUPPL. 3
32
TITLE: IN-SITU STUDY OF THE PREFERENTIAL ORIENTATION OF MAGNETRON SPUTTERED Ni-Ti THIN FILMS AS A FUNCTION OF BIAS AND SUBSTRATE TYPE
AUTHORS: Rui M S Martins; Norbert Schell; Manfred Beckers; Arndt Muecklich; Helfried Reuther; Rui J C Silva; Karimbi K Mahesh; Braz M B Fernandes;
PUBLISHED: 2008, SOURCE: International Conference on Shape Memory and Superelastic Technologies in SMST 2006: PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON SHAPE MEMORY AND SUPERELASTIC TECHNOLOGIES
AUTHORS: Rui M S Martins; Norbert Schell; Manfred Beckers; Arndt Muecklich; Helfried Reuther; Rui J C Silva; Karimbi K Mahesh; Braz M B Fernandes;
PUBLISHED: 2008, SOURCE: International Conference on Shape Memory and Superelastic Technologies in SMST 2006: PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON SHAPE MEMORY AND SUPERELASTIC TECHNOLOGIES
INDEXED IN: 
WOS
WOS33
TITLE: The dependence of the nanostructure of magnetron sputtered Cu-Ag alloy films on composition and temperature
AUTHORS: Pagh P Almtoft; Ejsing, AM; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2007, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 22, ISSUE: 4
AUTHORS: Pagh P Almtoft; Ejsing, AM; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2007, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 22, ISSUE: 4
34
TITLE: Nucleation and growth of Ti2AlN thin films deposited by reactive magnetron sputtering onto MgO(111) Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W; Hultman, L;
PUBLISHED: 2007, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 102, ISSUE: 7
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W; Hultman, L;
PUBLISHED: 2007, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 102, ISSUE: 7
35
TITLE: Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W; Hultman, L;
PUBLISHED: 2006, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 99, ISSUE: 3
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W; Hultman, L;
PUBLISHED: 2006, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 99, ISSUE: 3
36
TITLE: Phase stability of epitaxially grown Ti2AlN thin films Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 89, ISSUE: 7
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 89, ISSUE: 7
37
TITLE: The influence of the growth rate on the preferred orientation of magnetron-sputtered Ti-Al-N thin films studied by in situ x-ray diffraction Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
38
TITLE: Influence of the substrate bias on the size and thermal stability of grains in magnetron-sputtered nanocrystalline Ag films
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
39
TITLE: In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti-Al-N thin films
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 23, ISSUE: 5
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 23, ISSUE: 5
