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TITLE: Deposition of silicon nitride thin films by hot-wire CVD at 100 °C and 250 °C  Full Text
AUTHORS: Alpuim, P; L.M Gonçalves; E.S Marins; T.M.R Viseu; Ferdov, S; J.E Bourée;
PUBLISHED: 2009, SOURCE: Thin Solid Films, VOLUME: 517, ISSUE: 12
INDEXED IN: CrossRef