Leandro José Raniero
AuthID: R-000-92K
21
TITLE: Characterization of silicon carbide thin films prepared by VHF-PECVD technology Full Text
AUTHORS: Zhang, S; Raniero, L; Fortunato, E ; Pereira, L ; Martins, N; Canhola, P; Ferreira, I ; Nedev, N; Aguas, H ; Martins, R ;
PUBLISHED: 2004, SOURCE: 20th International Conference on Amorphous and Microcrystalline Semiconductors in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 338, ISSUE: 1 SPEC. ISS.
AUTHORS: Zhang, S; Raniero, L; Fortunato, E ; Pereira, L ; Martins, N; Canhola, P; Ferreira, I ; Nedev, N; Aguas, H ; Martins, R ;
PUBLISHED: 2004, SOURCE: 20th International Conference on Amorphous and Microcrystalline Semiconductors in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 338, ISSUE: 1 SPEC. ISS.
22
TITLE: MIS photodiodes of polyrnorphous silicon deposited at higher growth rates by 27.12 MHz PECVD discharge
AUTHORS: Aguas, H ; Pereira, L ; Raniero, L; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
AUTHORS: Aguas, H ; Pereira, L ; Raniero, L; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: 
Scopus 
WOS
Scopus WOS23
TITLE: Batch processing method to deposit a-Si : H films by PECVD
AUTHORS: Raniero, L; Aguas, H ; Pereira, L ; Fortunato, E ; Ferreira, I ; Martins, R ;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
AUTHORS: Raniero, L; Aguas, H ; Pereira, L ; Fortunato, E ; Ferreira, I ; Martins, R ;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS
Scopus WOS24
TITLE: Silicon etching in CF(4)/O(2) and SF(6) atmospheres
AUTHORS: Silva, A; Raniero, L; Ferreira, E; Aguas, H ; Pereira, L ; Fortunato, E ; Martins, R;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
AUTHORS: Silva, A; Raniero, L; Ferreira, E; Aguas, H ; Pereira, L ; Fortunato, E ; Martins, R;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS
Scopus WOS25
TITLE: Optical and morphological properties of annealed PbS thin films obtained from a chemical solution
AUTHORS: Raniero, L; Ferreira, CL;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
AUTHORS: Raniero, L; Ferreira, CL;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS
Scopus WOS26
TITLE: Spectral response of large area amorphous silicon solar cells
AUTHORS: Raniero, L; Martins, N; Canhola, P; Pereira, S; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: HIGH TEMPERATURE MATERIAL PROCESSES, VOLUME: 8, ISSUE: 2
AUTHORS: Raniero, L; Martins, N; Canhola, P; Pereira, S; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: HIGH TEMPERATURE MATERIAL PROCESSES, VOLUME: 8, ISSUE: 2
27
TITLE: Effect of the discharge frequency and impedance on the structural properties of polymorphous silicon Full Text
AUTHORS: Águas, H; Raniero, L; Pereira, L; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
AUTHORS: Águas, H; Raniero, L; Pereira, L; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
INDEXED IN: 
CrossRef
CrossRef28
TITLE: Polymorphous silicon films produced in large area reactors by PECVD at 27.12 MHz and 13.56 MHz
AUTHORS: Aguas, H ; Raniero, L; Pereira, L ; Fortunato, E ; Cabarrocas, PRI; Martins, R ;
PUBLISHED: 2003, SOURCE: Symposium on Amorphous and Nanocrystalline Silicon-Based Films held at the 2003 MRS Spring Meeting in AMORPHOUS AND NANOCRYSTALLINE SILICON-BASED FILMS-2003, VOLUME: 762
AUTHORS: Aguas, H ; Raniero, L; Pereira, L ; Fortunato, E ; Cabarrocas, PRI; Martins, R ;
PUBLISHED: 2003, SOURCE: Symposium on Amorphous and Nanocrystalline Silicon-Based Films held at the 2003 MRS Spring Meeting in AMORPHOUS AND NANOCRYSTALLINE SILICON-BASED FILMS-2003, VOLUME: 762
INDEXED IN: Scopus WOS
Scopus WOS