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Nuno Pessoa Barradas
AuthID:
R-000-DV0
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Article (230)
Proceedings Paper (28)
Review (2)
Erratum (1)
Correction (1)
Letter (1)
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Results:
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Publicações Confirmadas: 263
211
TÃTULO:
Composition of Ni-Ta-C thick films using simulated annealing analysis of elastic backscattering spectrometry data
Full Text
AUTORES:
Jeynes, C
;
Barradas, NP
; Wilde, JR; Greer, AL;
PUBLICAÇÃO:
2000
,
FONTE:
14th International Conference on Ion Beam Analysis/6th European Conference on Accelerators in Applied Research and Technology
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
161
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
212
TÃTULO:
Growth and characterisation of amorphous carbon films doped with nitrogen
Full Text
AUTORES:
Barradas, NP
;
Khan, RUA
; Anguita, JV; Silva, SRP; Kreissig, U;
Grotzschel, R
; Moller, W;
PUBLICAÇÃO:
2000
,
FONTE:
14th International Conference on Ion Beam Analysis/6th European Conference on Accelerators in Applied Research and Technology
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
161
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
213
TÃTULO:
Instrumentation amplifiers and voltage controlled current sources for LHC cryogenic instrumentation
AUTORES:
Agapito, JA;
Barradas, NP
; Cardeira, FM; Casas, J; Fernandes, AP; Franco, FJ; Gomes, P; Goncalves, IC; Cachero, AH; Lozano, J; Martin, MA;
Marques, JG
; Paz, A; Prata, MJ; Ramalho, AJG; Ruiz, MAR; Santos, JP; Vieira, A;
PUBLICAÇÃO:
2000
,
FONTE:
6th Workshop on Electronics for LHC Experiments
in
PROCEEDINGS OF THE SIXTH WORKSHOP ON ELECTRONICS FOR LHC EXPERIMENTS,
VOLUME:
2000,
NÚMERO:
10
INDEXADO EM:
WOS
NO MEU:
ResearcherID
214
TÃTULO:
Magnetoresistance enhancement in specular, bottom-pinned, Mn83Ir17 spin valves with nano-oxide layers
Full Text
AUTORES:
Veloso, A;
Freitas, PP
; Wei, P;
Barradas, NP
;
Soares, JC
;
Almeida, B
;
Sousa, JB
;
PUBLICAÇÃO:
2000
,
FONTE:
APPLIED PHYSICS LETTERS,
VOLUME:
77,
NÚMERO:
7
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
215
TÃTULO:
Neural network analysis of Rutherford backscattering data
Full Text
AUTORES:
Vieira, A
;
Barradas, NP
;
PUBLICAÇÃO:
2000
,
FONTE:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
170,
NÚMERO:
1-2
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
216
TÃTULO:
Simultaneous and consistent analysis of NRA, RES and ERDA data with the IBA DataFurnace
Full Text
AUTORES:
Barradas, NP
;
Parascandola, S
; Sealy, BJ;
Grotzschel, R
; Kreissig, U;
PUBLICAÇÃO:
2000
,
FONTE:
14th International Conference on Ion Beam Analysis/6th European Conference on Accelerators in Applied Research and Technology
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
161
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
217
TÃTULO:
Bayesian error analysis of Rutherford backscattering spectra
Full Text
AUTORES:
Barradas, NP
;
Jeynes, C
; Jenkin, M; Marriott, PK;
PUBLICAÇÃO:
1999
,
FONTE:
14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis
in
THIN SOLID FILMS,
VOLUME:
343,
NÚMERO:
1-2
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
218
TÃTULO:
Bayesian inference analysis of ellipsometry data
AUTORES:
Barradas, NP
; Keddie, JL; Sackin, R;
PUBLICAÇÃO:
1999
,
FONTE:
PHYSICAL REVIEW E,
VOLUME:
59,
NÚMERO:
5
INDEXADO EM:
Scopus
WOS
CrossRef
NO MEU:
ORCID
|
ResearcherID
219
TÃTULO:
Dose rate dependence of residual defects in device grade Si/SiGe heterostructures formed by ion beam synthesis
AUTORES:
Nejim, A; Cristiano, F; Knights, AP;
Barradas, NP
;
Hemment, PLF
; Coleman, PG;
PUBLICAÇÃO:
1999
,
FONTE:
Proceedings of the 1998 International Conference on 'Ion Implantation Technology' Proceedings (IIT'98)
in
Proceedings of the International Conference on Ion Implantation Technology,
VOLUME:
2
INDEXADO EM:
Scopus
NO MEU:
ORCID
220
TÃTULO:
Electrical behaviour associated with defect tails in germanium implanted silicon
AUTORES:
Nejim, A; Gwilliam, RM; Emerson, NG; Knights, AP; Cristiano, F;
Barradas, NP
; Jeynes, C;
PUBLICAÇÃO:
1999
,
FONTE:
Proceedings of the 1998 International Conference on 'Ion Implantation Technology' Proceedings (IIT'98)
in
Proceedings of the International Conference on Ion Implantation Technology,
VOLUME:
1
INDEXADO EM:
Scopus
NO MEU:
ORCID
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