Elvira Maria Correia Fortunato


AuthID: R-000-4M5

Confirmed Publications: 508



341
TITLE: Effect of thickness on the properties of ITO thin films deposited by RF-PERTE on unheated, flexible, transparent substrates  Full Text
AUTHORS: de Carvalho, CN ; Luis, A; Lavareda, G ; Fortunato, E ; Amaral, A ;
PUBLISHED: 2002, SOURCE: Spring Meeting of the European-Materials-Research-Society in SURFACE & COATINGS TECHNOLOGY, VOLUME: 151
INDEXED IN: Scopus WOS CrossRef: 17
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342
TITLE: Engineering of a-Si : H device stability by suitable design of interfaces  Full Text
AUTHORS: Martins, R ; Ferreira, I ; Aguas, H ; Silva, V; Fortunato, E ; Guimaraes, L;
PUBLISHED: 2002, SOURCE: SOLAR ENERGY MATERIALS AND SOLAR CELLS, VOLUME: 73, ISSUE: 1
INDEXED IN: Scopus WOS CrossRef
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343
TITLE: Growth model of gas species produced by the hot-wire and hot-wire plasma-assisted techniques
AUTHORS: Martins, R ; Ferreira, I ; Fortunato, E ;
PUBLISHED: 2002, SOURCE: 1st International Materials Symposium (Materials 2001) in ADVANCED MATERIALS FORUM I, VOLUME: 230-2
INDEXED IN: Scopus WOS
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344
TITLE: High quality a-Si : H films for MIS device applications  Full Text
AUTHORS: Aguas, H ; Fortunato, E ; Silva, V; Pereira, L ; Martins, R ;
PUBLISHED: 2002, SOURCE: E-MRS 2001 Spring Meeting in THIN SOLID FILMS, VOLUME: 403
INDEXED IN: Scopus WOS
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345
TITLE: Highly conductive/transparent ZnO : Al thin films deposited at room temperature by rf magnetron sputtering
AUTHORS: Fortunato, E ; Nunes, P; Marques, A; Costa, D; Aguas, H ; Ferreira, I ; Costa, MEV ; Martins, R ;
PUBLISHED: 2002, SOURCE: 1st International Materials Symposium (Materials 2001) in ADVANCED MATERIALS FORUM I, VOLUME: 230-2
INDEXED IN: Scopus WOS
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346
TITLE: Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films  Full Text
AUTHORS: Ferreira, I ; Fortunato, E ; Martins, R ; Vilarinho, P ;
PUBLISHED: 2002, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 91, ISSUE: 3
INDEXED IN: Scopus WOS CrossRef: 1
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347
TITLE: Influence of a DC grid on silane r.f. plasma properties  Full Text
AUTHORS: Aguas, H ; Fortunato, E ; Martins, R ;
PUBLISHED: 2002, SOURCE: 4th Iberian Vacuum Meeting (IVM-4) in VACUUM, VOLUME: 64, ISSUE: 3-4
INDEXED IN: Scopus WOS
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348
TITLE: Influence of hydrogen gas dilution on the properties of silicon-doped thin films prepared by the hot-wire plasma-assisted technique
AUTHORS: Ferreira, I ; Vilarinho, P ; Fernandes, F ; Fortunato, E ; Martins, R ;
PUBLISHED: 2002, SOURCE: 1st International Materials Symposium (Materials 2001) in ADVANCED MATERIALS FORUM I, VOLUME: 230-2
INDEXED IN: Scopus WOS
IN MY: ORCID | ResearcherID
349
TITLE: Influence of the plasma regime on the structural, optical and transport properties of a-Si : H thin films
AUTHORS: Aguas, H ; Martins, R ; Fortunato, E ;
PUBLISHED: 2002, SOURCE: 1st International Materials Symposium (Materials 2001) in ADVANCED MATERIALS FORUM I, VOLUME: 230-2
INDEXED IN: Scopus WOS
IN MY: ORCID | ResearcherID
350
Página 35 de 51. Total de resultados: 508.

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