Rui Manuel Coelho da Silva
AuthID: R-000-FX3
111
TÃTULO: Electrical conductivity in ion implanted TiO2-single crystals
AUTORES: Fromknecht, R; Khubeis, I; Massing, S; Meyer, O; da Silva, RC; Alves, E ;
PUBLICAÇÃO: 1999, FONTE: Proceedings of the 1998 International Conference on 'Ion Implantation Technology' Proceedings (IIT'98) in Proceedings of the International Conference on Ion Implantation Technology, VOLUME: 2
AUTORES: Fromknecht, R; Khubeis, I; Massing, S; Meyer, O; da Silva, RC; Alves, E ;
PUBLICAÇÃO: 1999, FONTE: Proceedings of the 1998 International Conference on 'Ion Implantation Technology' Proceedings (IIT'98) in Proceedings of the International Conference on Ion Implantation Technology, VOLUME: 2
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ORCID
ORCID112
TÃTULO: Lattice site location and annealing behavior of W implanted TiO2 Full Text
AUTORES: da Silva, RC; Alves, E ; Redondo, LM ; Fromknecht, R; Meyer, O;
PUBLICAÇÃO: 1998, FONTE: 13th International Conference on Ion Beam Analysis (IBA-13) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 136
AUTORES: da Silva, RC; Alves, E ; Redondo, LM ; Fromknecht, R; Meyer, O;
PUBLICAÇÃO: 1998, FONTE: 13th International Conference on Ion Beam Analysis (IBA-13) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 136
113
TÃTULO: The modification of mechanical properties and adhesion of boron carbide sputtered films by ion implantation Full Text
AUTORES: Chiang, CI; Meyer, O; daSilva, RMC;
PUBLICAÇÃO: 1996, FONTE: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 117, NÚMERO: 4
AUTORES: Chiang, CI; Meyer, O; daSilva, RMC;
PUBLICAÇÃO: 1996, FONTE: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 117, NÚMERO: 4
114
TÃTULO: Evidence for Oxygen Bubbles in Fluorine Doped Amorphous Silicon Dioxide Thin Films
AUTORES: Dias, AG; Bustarret, E; da Silva, RC;
PUBLICAÇÃO: 1988, FONTE: The Physics and Technology of Amorphous SiO2
AUTORES: Dias, AG; Bustarret, E; da Silva, RC;
PUBLICAÇÃO: 1988, FONTE: The Physics and Technology of Amorphous SiO2
115
TÃTULO: A Channeling Study of the Superionic ß-PbF2
AUTORES: Silva, RC; Boerma, DO; Hartog, HW;
PUBLICAÇÃO: 1988, FONTE: Nuclear Physics Applications on Materials Science
AUTORES: Silva, RC; Boerma, DO; Hartog, HW;
PUBLICAÇÃO: 1988, FONTE: Nuclear Physics Applications on Materials Science
