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TÍTULO: 32nm general purpose bulk CMOS technology for high performance applications at low voltage  Full Text
AUTORES: Arnaud, F; Liu, J; Lee, YM; Lim, KY; Kohler, S; Chen, J; Moon, BK; Lai, CW; Lipinski, M; Sang, L; Guarin, F; Hobbs, C; Ferreira, P ; Ohuchi, K; Li, J; Zhuang, H; Mora, P; Zhang, Q; Nair, DR; Lee, DH; Chan, KK; Satadru, S; Yang, S; Koshy, J; Hayter, W; Zaleski, M; Coolbaugh, DV; Kim, HW; Ee, YC; Sudijono, J; Thean, A; Sherony, M; Samavedam, S; Khare, M; Goldberg, C; Steegen, A; ...Mais
PUBLICAÇÃO: 2008, FONTE: 2008 IEEE International Electron Devices Meeting, IEDM 2008 in Technical Digest - International Electron Devices Meeting, IEDM
INDEXADO EM: Scopus CrossRef: 13