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TÍTULO: Development of resistors with TaxNy deposited by RF sputtering using lithography technique
AUTORES: César, RR; Mederos, M; Joanni, E; Andrade, VM; Teixeira, RC; Diniz, JA;
PUBLICAÇÃO: 2023, FONTE: 2023 37th Symposium on Microelectronics Technology and Devices (SBMicro)
INDEXADO EM: CrossRef
NO MEU: ORCID