Raised Source Drain Metal Diffusion in Finfet

AuthID
 P-00Z-Z9P
4
Author(s)
Raveendra, G
·
Nesama, IFP
·
Prabha, VL
Tipo de Documento
Proceedings Paper
Year published
2013
Publicado
in PROCEEDINGS OF 2013 INTERNATIONAL CONFERENCE ON CIRCUITS, POWER AND COMPUTING TECHNOLOGIES (ICCPCT 2013)
Páginas: 741-745 (5)
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Wos®
Publication Identifiers
Wos: WOS:000394455600129
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