Influence of Oxygen on the Iridium Silicide Formation by Rapid Thermal Annealing

AuthID
 P-012-FD8
5
Author(s)
FERNANDEZ, M
·
RODRIGUEZ, T
·
ALMENDRA, A
·
JIMENEZLEUBE, J
·
2
Editor(es)
Dawson,LR;Appelbaum,A
Tipo de Documento
Proceedings Paper
Year published
1994
Publicado
in INFRARED DETECTORS - MATERIALS, PROCESSING, AND DEVICES, ISSN: 0272-9172
Volume: 299, Páginas: 325-328 (4)
Indexing
Wos®
Scopus®
Crossref®7
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-0028026433
Wos: WOS:A1994BB24N00045
Source Identifiers
ISSN: 0272-9172
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service