Thermodynamic Stability of High-K Dielectric Metal Oxides Zro2 and Hfo2 in Contact with Si and Sio2

AuthID
 P-014-YYE
7
Author(s)
Gutowski, M
·
Jaffe, JE
·
Liu, CL
·
Stoker, M
·
Hegde, RI
·
Tobin, PJ
Tipo de Documento
Article
Year published
2002
Publicado
in APPLIED PHYSICS LETTERS, ISSN: 0003-6951
Volume: 80, Número: 11, Páginas: 1897-1899 (3)
Indexing
Wos®
Google Scholar®
Publication Identifiers
Wos: WOS:000174363300014
Source Identifiers
ISSN: 0003-6951
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2024 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service