Fe and Cu in Si: Lattice Sites and Trapping at Implantation-Related Defects

AuthID
P-004-FXF
5
Author(s)
1
Group Author(s)
ISOLDE Collaboaration
Tipo de Documento
Article
Year published
2006
Publicado
in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ISSN: 0168-583X
Volume: 253, Número: 1-2, Páginas: 167-171 (5)
Conference
Symposium on Si-Bases Materials for Advanced Microelectronic Devices Held at the 2006 E-Mrs Spring Meeting, Date: MAY 29-JUN 02, 2006, Location: Nice, FRANCE, Patrocinadores: European Mat Res Soc, IUMRS, ICEM
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-33751331726
Wos: WOS:000243178600034
Source Identifiers
ISSN: 0168-583X
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