Ab Initio Modeling of Interstitial Oxygen in Crystalline Sige Alloys

AuthID
 P-004-K68
4
Author(s)
Tipo de Documento
Article
Year published
2006
Publicado
in JOURNAL OF NON-CRYSTALLINE SOLIDS, ISSN: 0022-3093
Volume: 352, Número: 9-20, Páginas: 1279-1281 (3)
Conference
21St International Conference on Amorphous and Nanocrystalline Semiconductors, Date: SEP 04-09, 2005, Location: Lisbon, PORTUGAL
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Publication Identifiers
SCOPUS: 2-s2.0-33745472366
Wos: WOS:000238782900101
Source Identifiers
ISSN: 0022-3093
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