Properties of Tantalum Oxynitride Thin Films Produced by Magnetron Sputtering: The Influence of Processing Parameters

AuthID
P-006-67P
10
Author(s)
Cristea, D
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Constantin, D
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Crisan, A
·
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Tipo de Documento
Article
Year published
2013
Publicado
in VACUUM, ISSN: 0042-207X
Volume: 98, Páginas: 63-69 (7)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84885419245
Wos: WOS:000322805900013
Source Identifiers
ISSN: 0042-207X
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